Manual, Semiautomatic and Automatic

SPM produces full automatic and semiautomatic single wafer equipment tailored according customer needs.

Wafer size could be from 3” up to 8”. An automatic robot handles wafers one by one loading into process chamber(s) catching them from carrier.

The complete process is executed into a single chamber:

  • Chemical process from several buffer tanks;
  • Rinse;
  • Wafer Scrubbing (Optional);
  • Megasonic (Optional);
  • N2 bubble (Optional);
  • Dry with high speed spinner.

Process tanks

Full automatic single wafer surface preparation equipment. Capable to handle wafer size from 3 up to 6 in. 5 process tanks and 5 buffer tanks.

Process tanks are entirely realized in PTFE (Optional Conductive PTFE) and includes:

  • Rotational chuck with brushless servomotor (adjustable speediness till 3000 rpm max), with vacuum for wafer hold;
  • Up/DW electrical Axis: load-unload of wafer from chamber and distance from liquid setup;
  • Automatic cover with electric actuator;
  • Chemical solution mixing and heating: solution comes from the buffer tank, by pump;
  • N2 atmosphere: inlet of N2 during the process;
  • Localized controlled exhaust: automatic exhaust control;
  • 360° overflow with solution recovery into buffer tank;
  • Optional- wafer scrubbing: in-out electrical axis for wafer scrubbing with rotation motor and high-performance scrubbing sponge;
  • Optional- megasonic: megasonic array at tank bottom for cleaning process;
  • Optional- N2 bubble: N2 inlet inside the process tank solution;
  • Optional- Oxygen concentration monitoring;
  • Optional- pH drain monitoring;
  • Optional- redox drain monitoring;
  • Optional- resistivity drain monitoring.

Process tanks typology vary according to process needs. SPM latest technology is called “floating effect” (Patented).

SPM Patented
“Floating process”

Since 3 years, SPM launches also a new way of processing.
The original idea that focused us on the problem was to find an innovative method to process single wafer.
Starting with that objective SPM engineers found a new design for process tank based on the principle of floating the wafer on the chemical solution.

Several Buffer tanks can be installed into the system and can be equipped with:

  • Magnetic levitation pump for recirculation and solution delivery to process tank with automatic flow control
  • Flowmeter
  • Filtration
  • Chemical mixing with high precision flowmeters or balance
  • Heater /chiller with temperature sensor
  • Analogue level sensor for controlling the exact volume of the solution

Buffer tank material vary depending on chemicals and temperature:

  • PVDF (up to 90 °C solutions)
  • Stainless steel 316L (for solvents)
  • PE (room temperature)
  • Quartz (high temperature solutions)
  • PTFE
  • Halar
  • PFA

Process sequence can be defined according to customer needs. Process tanks could be “standalone” with all steps inside a unique tank or separated, with several process tanks that execute only single recipe steps. In this case, transfer from one process tank to another can be executed without air contact with special “floating effect” liquid slides.

Single wafer processing equipment are ruled by PLC and touch screen to manage entire system. Software is developed by SPM engineers with modern graphic and with extensive features like:

  •  Recipe management;
  • Datalogging: real time and historical;
  • P&I direct control: act directly on valves and pumps for maintenance;
  • Host SECS-GEM interface (optional).

All tools are realized following safety CE rules. We can build our equipment with ATEX certification in case it’s needed.



Full Automatic single wafer processing equipments

Research Centers / Labs

Hood for Chemical labs