Standalone dryer equipments
Different technology can be used to reach the goal of drying. Solution vary according to product dimension, particles, drying speed, single wafer or carrier loading.
SPM standalone dryer can be ordered to operate with single wafer or batch, using carriers.
Technology that SPM can provide are:
- HOT N2 drying
- Spin dryer
- Alcohol meniscus
Simplest method is using just HOT N2 produced inline by a dedicated heater. Tank material is SS316L, optionally covered by PTFE to minimize particle deposition on tank walls.
Spin dryer can includes also rinse cycles. Tank can be designed for single wafer use or batch. In this case a motorized motor rotates up to 4000 rpm to spin away waters particles.
Alcohol meniscus dryer are used in case of extremely restrictive particles requirements. Special tank warrant the possibility to rinse wafer and then inlet IPA on the top. Drain of the liquid or rising of the wafer creates a meniscus of alcohol on wafer surface that make possible the drying of the surface. Hot N2 is also injected to help the drying process.
Dryers equipment are ruled by PLC and touch screen to manage entire system. Software is developed by SPM engineers with modern graphic and with extensive features like:
- Recipe management
- Datalogging: real time and historical
- P&I direct control: act directly on valves and pumps for maintenance
- Host SECS-GEM interface (optional)
All tools are realized following safety CE rules.