Full automatic wet bench for solvent processes. Detailed view of the working plan. From left: N∞2 SS316L electropolished process tanks with automatic cover-vapours condensation-carrier agitation, Robot hand cleaning station; capable to handle two 8in wafer carriers.

Full automatic wet bench for solvent processes. Detailed view of the working plan. From left: N∞2 SS316L electropolished process tanks with automatic cover-vapours condensation-carrier agitation, Robot hand cleaning station; capable to handle two 8in wafer carriers.

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Full automatic wet bench for solvent processes. Detailed view of the working plan. From left: N∞2 SS316L electropolished process tanks with automatic cover-vapours condensation-carrier agitation, Robot hand cleaning station; capable to handle two 8in wafer carriers.